The scope of the publication includes, but is not limited to Reliability of: Devices, Materials, Processes, Interfaces, Integrated Microsystems (including MEMS & Sensors), Transistors, Technology (CMOS, BiCMOS, etc.), Integrated Circuits (IC, SSI, MSI, LSI, ULSI, ELSI, etc.), Thin Film Transistor Applications. The measurement and understanding of the reliability of such entities at each phase, from the concept stage through research and development and into manufacturing scale-up, provides the overall database on the reliability of the devices, materials, processes, package and other necessities for the successful introduction of a product to market. This reliability database is the foundation for a quality product, which meets customer expectation. A product so developed has high reliability. High quality will be achieved because product weaknesses will have been found (root cause analysis) and designed out of the final product. This process of ever increasing reliability and quality will result in a superior product. In the end, reliability and quality are not one thing; but in a sense everything, which can be or has to be done to guarantee that the product successfully performs in the field under customer conditions. Our goal is to capture these advances. An additional objective is to focus cross fertilized communication in the state of the art of reliability of electronic materials and devices and provide fundamental understanding of basic phenomena that affect reliability. In addition, the publication is a forum for interdisciplinary studies on reliability. An overall goal is to provide leading edge/state of the art information, which is critically relevant to the creation of reliable products.
《IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY》期刊已被查看: 次
此期刊被最新的JCR期刊SCIE收录
期刊官网:http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=7298 |
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期刊投稿网址:http://mc.manuscriptcentral.com/tdmr |
PubMed Central (PMC)链接 :http://www.ncbi.nlm.nih.gov/nlmcatalog?term=1530-4388%5BISSN%5D |
通讯地:IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 445 HOES LANE, PISCATAWAY, USA, NJ, 08855-4141 |
中国科学院《国际期刊预警名单(试行)》名单 |
2024年02月发布的2024版:不在预警名单中 2023年01月发布的2023版:不在预警名单中 2021年12月发布的2021版:不在预警名单中 2020年12月发布的2020版:不在预警名单中 此期刊被最新的JCR期刊SCIE收录 |
版面费 | 审稿速度 | 收录数据库 | 是否oa | 研究方向 |
---|---|---|---|---|
较慢,6-12周 | SCIE,Scopus | No | 工程技术-工程:电子与电气 |
大类学科 | 分区 | 小类学科 | Top期刊 | 综述期刊 |
---|---|---|---|---|
工程技术 | 3区 | ENGINEERING ELECTRICAL & ELECTRONIC 工程:电子与电气 PHYSICS APPLIED 物理:应用 |
否 | 否 |
版本 | 按学科 | 分区 | 影响因子 |
---|---|---|---|
2023-2024年最新版 | ENGINEERING ELECTRICAL & ELECTRONIC PHYSICS APPLIED |
Q2 | 2.5 |
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